Amorphous, dense and conformal coatings deposited at low temperature
Entegris specializes in deposition of Silicon and Carbon based high-performance coatings using proprietary low temperature (<150°C) PECVD processes. The coatings are deposited in a high vacuum environment by plasma decomposition of precursor gases. The proprietary PECVD deposition can be used to deposit coatings on a variety of vacuum compatible substrates including metals, alloys, ceramics, semiconductors and polymers.
- Amorphous and dense
- Ultra high purity (99.995%)
- Microconformal coatings replicate the surface finish of the substrate
- Uniform deposition on complex 3-D objects
- Wide area coating capability, including large process chambers
Entegris has coating chambers that can accommodate different shapes and sized items, up to 31" in diameter.