Close
 
header top curve
Home   >   Products   >   Specialty Materials   >   Specialty Coatings   >   PECVD Coatings

Products

Select one or more of the following fields in order to begin your search.
  Search by Industry   Applications or process step   Keyword or Product Name      
   and/or   and/or      Search

Special Note: Some product links may direct you to our peripheral websites (devicecare.com, diskcare.com, entegrisfluidhandling.com, entegrisfuelcells.com, entegrislifesciences.com, pvprocesssolutions.com, or wafercare.com)

Plasma Enhanced Chemical Vapor Deposition (PECVD) Coatings

Amorphous, dense and conformal coatings deposited at low temperature

Entegris specializes in deposition of Silicon and Carbon based high-performance coatings using proprietary low temperature (<150°C) PECVD processes. The coatings are deposited in a high vacuum environment by plasma decomposition of precursor gases. The proprietary PECVD deposition can be used to deposit coatings on a variety of vacuum compatible substrates including metals, alloys, ceramics, semiconductors and polymers.

 

Benefits

  • Amorphous and dense
  • Ultra high purity (99.995%)
  • Microconformal coatings replicate the surface finish of the substrate
  • Uniform deposition on complex 3-D objects
  • Wide area coating capability, including large process chambers

 

Process Capabilities
Entegris has coating chambers that can accommodate different shapes and sized items, up to 31" in diameter.
OxiMax™ Coating
Ultrapure, transparent silicon oxide coating
  • Oxidation and errosion resistant
  • Optically transparent
  • Excellent breakdown voltage
  • Particle reduction during semiconductor wafer processing
  • AR properties make it suitable for coating IR optics
SilicoMax™ Coating
Ultrapure silicon carbide coating
  • High-purity, dense and mirco-conformal coating with very low residual stress
  • Oxidation resistance, especially in the presence of moisture
  • High electrical resistivity
  • Corrosion resistant in acids and alkalis
  • Low-temperature plasma deposition process
  • Coating composition can be tailored from silicon rich to stoichiometic silicon carbide
  • Applications for semiconductor and optics markets
TranSiMax™ Coating
Transparent hard silicon nitride coating
  • Suitable for high-temperature oxidation/corrosion protection of ceramic materials
  • Optically transparent
  • Exhibits excellent breakdown voltage
  • Low-temperature vacuum plasma process
  • Coating composition can be tailored to deposit a family of silicon nitride coatings
  • Reduces particles and plasma attack during semiconductor wafer processing
UltraC Diamond™ Coating
Ultrahard diamond-like carbon coating
  • Extremely wear resistant and super hard
  • Exhibits ultra-low friction
  • Highly corrosion resistant
  • Stops the formation of macro and submicroscopic wear debris
  • For use in biomedical applications, air bearings, metal forming tools, plastic injection molded components, semiconductor chamber components and other anti-friction applications
UltraC-HT™ Coating
Exceptionally tough diamond-like carbon
  • Mono-dimensionally modulated (MDM) coating system consists of individual layers of two materials differing in elastic modulus
  • Excellent abrasive/erosion wear resistance
  • Extreme toughness
  • High strength
  • Super lubricious
  • Applications in semiconductor, medical, aerospace and oil exploration markets
Ultrapure Silicon Coating
Ultra-high purity silicon coating
  • 99.995% purity
  • Dense, hard and micro-conformal
  • Excellent adhesion and compliance on a wide variety of substrates
  • Excellent surface smoothness
  • Low residual stress
  • Applications in semiconductor equipment and optics markets