Tuesday, March 15, 2011
Shanghai, China
Shanghai New International Expo Center (SNIEC)
Visit the SEMICON CHINA 2011 website for more information.
Event Dates
Tuesday, March 15, 10:00 am - 5:00 pm
Wednesday, March 16, 10:00 am - 5:00 pm
Thursday, March 17, 10:00 am - 4:00 pm
Visit us at Booth 3419, Hall W3
Click here to download the SEMICON China 2011 Exhibitor booth floor plan
Featured Products
450 mm Wafer Handling
Working closely with semiconductor device manufacturers and silicon wafer manufacturing customers around the world, Entegris is leading the way in 450 mm wafer handling development.
Front Opening Shipping Box (FOSB)
The SB300 wafer shipping box is engineered to improve overall productivity for your facility by offering maximum wafer protection, optimum automation interface and increased overall yield.
Advanced FOUP Environment Control
Driven by our customers' technology roadmaps, we provide unique and patented technologies with advanced microenvironment control in FOUPs.
Impact® Duo 5 nm Photochemical Filter
With the most advanced integration of sieving and nonsieving filtration technology, Impact Duo photochemical filters have a proven 5 nm defect performance in 193 nm immersion resists. The new nylon/UPE composite membrane will further reduce pressure drop and defect counts.
Impact® 2 Filters
Impact filters are designed for point-of-use (POU) photochemical applications such as BARC, photoresist and TARC materials. Utilizing advanced UPE (ultra-high molecular weight polyethylene) or nylon membranes and Connectology® design, Impact filters remove hard particles and gels from photochemicals.
SilverSet™ AMC Filters
Asymmetric configuration of hybrid filters for scanner air filtration. SilverSet enabled higher capacity for condensable organic AMC correspond to 15% longer life, which also prevents unwanted chemical reactions due to NH3-removing media.
Torrento® SPM 15 nm Filters
Designed for use in high-temperature SPM cleaning processes, the new Torrento SPM 15 nm chemical filter combines unsurpassed retention of particles as small as 15 nm with the industry leading flow rate at the specified retention rating.
Savana™ Liquid Filter
Hydrophilic asymmetric PS membrane provides high flow, longer life-time filters that are ideally suited for filtration of weak acids, bases and ultra-pure DI water in photovoltaic, flat panel display, data storage and consumer electronics industries.
Planarcore® PVA Brushes
As the next generation in post-CMP cleaning applications, Planarcore PVA brushes feature a variety of new design modifications and enhanced surface properties. The unique molded-through-the-core construction using high-purity PVA allows for more efficient cleanings, reducing brush break-in and flush up.
Planargard® NMB Filters
New Continuous-Melt-Blown (CMB) membrane developed for bulk slurry filtration and point of use applications at sub 32 nm nodes.
CR4/CR8 3-way Valves
The all-polymer CR4 and CR8 3-way valves are designed for use in semiconductor grade chemicals. A three-ported directional valve enables simplification of piping system design while minimizing its footprint.
Entegris is also featuring . . .
Compound Semiconductor (LED) Solutions
Entegris' purification and filtration products enable the manufacturing high brightness LEDs with the highest photoluminescence peaks and luminous efficiencies, while our 30+ years of wafer shipping experience allows us to design the ultimate protection for these critical substrates.
Solar Solutions
Entegris brings a broad portfolio of proven contamination control, fluid management and substrate handling solutions to solve the challenges faced in the manufacturing environment. The new Entegris Multifunction Solar Shipper is designed to provide wafer and cell manufactures with decreased breakage, improved transportation efficiencies, and lower labor and waste costs.
Material Solutions
Graphite, silicon carbide, and coatings products that provide enhanced strength, purity, thermal conductivity, stiffness and electrical properties for use in leading edge lithography, deposition, etch, implant, LED, Flat Panel Display, Photovoltaic & Compound semiconductor (HBLED) applications.
Entegris is also speaking in CSTIC on CMP & Post-CMP Cleaning Symposium V
Date/Time: 14 March, 15:50-16:15 hrs
Venue: Kerry Hotel Pudong, Shanghai, China (Shangri-la Group)
Session VI: Defect Reduction
Title: A Novel Approach for More Effective Wafer Edge Post-CMP Cleaning
R.K. Singh, C. Patel, D. Trio, E. McNamara and C.R. Wargo , Entegris, Inc., USA
Click here for Session VI agenda.