Moscone Center
747 Howard Street
San Francisco, California, USA
www.semiconwest.org
Exhibit Hours
Tuesday, July 15 10:00am–6:00pm
Wednesday, July 16 10:00am–6:00pm
Thursday, July 17 10:00am–4:00pm
Event Dates
Programs & Events July 14 - 18
Exhibits July 15 - 17
Visit Entegris at Booth #1021, South Hall
Featured Products:
High viscosity photochemical pump
Specifically designed to address high throughput / short cycle time and bubble prevention needs of Wafer Level Packaging and MEMS markets.
Front Opening Unified Pod (FOUP)
Next-generation carrier technologies for in-fab wafer processing.
Impact® 2, Impact® Plus and Impact® Mini filters
Impact filters are designed for point-of-use (POU) photochemical applications such as BARC, photoresist and TARC materials. Utilizing Entegris’ UPE (ultra high molecular weight polyethylene) membranes and connectology design, Impact filters remove hard particles and gels from photochemicals.
Gatekeeper® corrosive gas purifier
Available for low and high flow point-of-use applications, Entegris’ Gatekeeper corrosive gas purifiers are designed for use with HCl. HCl is primarily used in the semiconductor industry for wafer etching or chamber cleaning. The newly introduced corrosive purifiers contain a proprietary media which removes moisture from HCl down to <60 ppb. Lifetime has also been extended. The purifiers can last up to 3 times longer than previous versions.
Torrento™ 20 nm wet etch and clean filter
Torrento wet etch and clean (WEC) filters provide 20 nm particle retention with ultra-high flow rate performance with a nondewetting Teflon® membrane. Optimized for leading edge recirculated bath processes, Torrento filter users can experience high yield, rapid bath cleanup cycles, extended filter life, fast changeouts and cleanliness – all in a prewet package for ease-of-use.
Clarilite reticle haze prevention system
The Clarilite system is the first comprehensive solution to help semiconductor manufacturers address the quality and cost issues associated with reticle haze in 193 nm lithography.
LiquidLens™ UPW purification system
Entegris brings technologies and competencies together in the LiquidLens UPW purification system to enable immersion lithography process advancements.
SB300 FOSB
The Entegris SB300 is the first combined FIMS and manual door opening FOSB. Its robust design and construction make it an ideal candidate for reuse as a back end shipper or for IDM internal loops.
Planarcore® PVA brush
Planarcore PVA brushes are designed to deliver superior performance and wafer-to-wafer uniformity in post CMP wafer cleaning applications. The unique molded-through-the-core technology provides absolute adhesion of the PVA (polyvinyl alcohol) to the brush core, unlike standard PVA products that are merely friction fitted to the core.
Specialty Coatings
Entegris specializes in deposition of high performance coatings using proprietary low temperature (<150°C) PECVD processes. Developed from the Surmet™ specialty coating technologies, the coatings are deposited in high vacuum by plasma decomposition of precursor gases. PECVD deposition is used on a variety of vacuum compatible substrates including metals, alloys, ceramics, semiconductors and polymers.