Designed for use with AMAT®, OnTrak® and Ebara® CMP equipment, Planarcore® PVA brushes feature molded-through-the-core construction for superior performance and wafer-to-wafer cleaning consistency. While other brushes are merely friction fitted, the molded-through-the-core construction prevents PVA slippage and improves dimensional stability.
Planarcap® KPX Filters
Planarcap® KPX Point-of-Dispense CMP filters feature an optimized graded media depth filter with all polypropylene construction. Developed for use with ILD, Cu, W and STI process steps, Planarcap KPX filters provide the best combination of surface area and media gradient.
AMAT® is a registered trademark of Applied Materials, Inc.
OnTrak® is a registered trademark of Lam Research Corporation
Ebara® is a registered trademark of Ebara Corporation
