Optimized for leading edge recirculated bath processes, Torrento™ wet etch and clean (WEC) filters provide 20 nm particle retention with ultra-high flow rate performance with a nondewetting Teflon® membrane.
Impact® Filters
Impact® point-of-use (POU) filters with asymmetric nylon membranes reduce the formation of microbridging defects in 193 nm photolithograpy applications. At two times the performance of existing nylon filters, the improved flow rate eliminates the risks previously associated with using tighter nylon filtration.
Scanner Pre-Filter
The Scanner Pre-Filter provides increased lens protection from airborne low molecular weight silicon (LMWSi) and condensable organic species satisfying Nikon®, ASML™ and Canon® photo bay environment specifications.
Teflon® is a registered trademark of E.I. du Pont de Nemours and Company
