EUV Pod
Successful wafer fabrication using Extreme Ultra Violet (EUV) technology requires several advancements to reticle carriers to ensure defect-free reticle handling. Entegris has collaborated with leading lithography equipment suppliers and industry organizations in the development of an EUV mask carrier capable of meeting these stringent requirements.
The EUV pod from Entegris is a dual pod design having both an inner carrier and outer shell to maintain a contamination-free environment. In laboratory tests, the EUV pod was shown to provide defect-free protection of EUV reticles during shipping, storage, handling and vacuum-transferring operations with 40 nm SiO2 equivalent particle sizes.