New CMP technologies being introduced include:

• Molded-through-the-core PVA Brushes for post CMP cleaning
• Planarcap® KPX CMP point-of-dispense filter with graded media pleating technologies

New filtration technologies being introduced include:

• Asymmetric nylon point-of-use photochemical filters to reduce microbridging defects in photochemical applications
• Ultra-retentive, high-flow wet etch and clean filter with a nondewetting surface modified Teflon® membrane
• Scanner pre-filter to provide protection for low molecular weight silicon on lens optics

Entegris fluid handling systems comprise the industry’s broadest range of carefully developed and fully characterized fluid handling products. Our products are rigorously tested to ensure reliability and constructed of robust materials that are able to withstand corrosive chemicals. All of our fluid handling products will improve the output of your fab by keeping your processes pure and efficient.

New purification technologies being introduced include:

• Continuous high-flow XCDA® (Extreme Clean Dry Air) point-of-use purge gas at a low cost of ownership
• Ultimate protection from ion contamination in critical cleaning applications at high temperatures

Entegris’ Specialty Materials Division has increased its materials portfolio and systems to meet the ever increasing demands of wafer processing. Guided by the Industry Technology Roadmap, Entegris has concentrated on the development of inert materials to enable the latest technology integration for OEMs and end-users. Capabilities include:

• Premium carbon/graphite consumables
• Customized Silicon and Carbon based coatings
• Advanced polymers dispersed with carbon nanotubes
• Unique pre-treatment and refurbishment processes

New system technologies being introduced include:

• IntelliGen® Mini dispense system with two-stage technology to reduce microbridging defects
• High-flow ultrapure water purification system to enable immersion lithography applications