The benefits of chemical filtration in the production of semiconductor devices have been well accepted by the industry for several decades. As the technology has evolved, increasing contamination control requirements have driven the need to upgrade filtration to remove particles measuring 30 nm and smaller.
Traditional optical particle counting techniques used to measure particle removal efficiencies have not kept pace with the industry’s requirements for tighter filtration and reproducible retention ratings. Novel techniques for measuring filter particle retention are needed to meet the demands of the microelectronics industry.
Entegris is sharing the highlights of this new testing method to demonstrate the improved accuracy of our sub-30 nm retention ratings on liquid filters. The method has been developed and refined over several years resulting in an accurate and reproducible way to measure particle removal efficiencies for sub-30 nm pore size rated filters.
The method uses a fluorescence strength signal as emitted by fluorescent dyed particles. There are several advantages to the fluorescence method compared to traditional OPC techniques. A significant advantage is that the fluorescence method has no inherent particle size limitations; it is only limited by the availability of the fluorescent particles.
To learn more please contact Entegris via email.