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BILLERICA, Mass. – Sept. 13, 2017 – Entegris Inc. (NASDAQ: ENTG), a leading specialty materials provider, announced at SEMICON® Taiwan today the availability of its new GateKeeper® GPU (gas purification unit) corrosive gas purifiers to improve factory efficiencies. The new GPU corrosive gas purifiers incorporate Entegris’ advanced media and are specifically designed to simultaneously mitigate moisture and capture volatile metal particulates from 18 different gases, including Cl2, HBr, HCl, CF4, BCl3, SO2, and SF6 to improve wafer production yield.
“Contaminants from the metallic components of process tools, such as plumbing and tubing, play a critical role in contaminant generation in corrosive gases,” said Entegris Vice President of Gas Microcontamination Control, Chris Vroman. “Transition metals such as chromium, iron, manganese, molybdenum and nickel – as well as group metals including sodium, calcium and aluminum – degrade CMOS gate stacks and reduce carrier lifetime. The new Gatekeeper purifier media, paired with an internal Wafergard® gas filter, provide the leading defense against these corrosive gas contaminants that reduce yield.”
Constructed using new, advanced proprietary media adsorbents, combined with nickel corrosion-resistant 3 nm particle filtration, the new Gatekeeper solution features best-in-class outlet purity (as measured in the process gas), a 15 ppb moisture removal specification for volatile metals, and greater than 2X higher capacity than commercially available purifiers for longer purifier lifetime. The GPU gas purifiers can be installed in any orientation and target corrosive gas delivery systems used in dry etch and epitaxial processes. -
For more information, please visit the Entegris product display area, booth #176, during SEMICON Taiwan, Sept. 13-15, 2017, at the Taipei Nangang Exhibition Center, or visit