Controlling contaminants in process streams is a vital way to improve operating efficiency and enable technology advances. Entegris offers a variety of membrane and media to match the chemical compatibility and process conditions of each manufacturing environment.
Entegris offers a full solution of PURE products that are designed to work together in the chemical supply chain – when using these products together the fluid path remains pure. Leveraging our materials expertise, comprehensive product portfolio, application expertise and technology we help you to solve the growing industry problem of contamination caused by particles, organics and metals.
Visit us at SPIE Advanced Lithography to learn how Entegris is uniquely qualified and committed to jointly developing clean chemical delivery solutions that improves yield and reduces cost from production to consumption. See you there!
Join us for 3 poster sessions or visit us at Booth # 304.
スピーカー
- Huaping Wang
- Aiwen Wu
- Tetsu Kohyama
Controlling contaminants in process streams is a vital way to improve operating efficiency and enable technology advances. Entegris offers a variety of membrane and media to match the chemical compatibility and process conditions of each manufacturing environment.
Entegris offers a full solution of PURE products that are designed to work together in the chemical supply chain – when using these products together the fluid path remains pure. Leveraging our materials expertise, comprehensive product portfolio, application expertise and technology we help you to solve the growing industry problem of contamination caused by particles, organics and metals.
Visit us at SPIE Advanced Lithography to learn how Entegris is uniquely qualified and committed to jointly developing clean chemical delivery solutions that improves yield and reduces cost from production to consumption. See you there!
Join us for 3 poster sessions or visit us at Booth # 304.
/content/entegris-live/ja/home/about-us/events/spie-advanced-lithography-2018Poster Sessions on Tuesday, Feb. 27 from 5:30 - 7:30 PM in Hall 2.
"EUV for high volume IC manufacturing using EUV lithography"
Presented by: Huaping Wang.
"A novel filter with unique membrane morphology for defect reduction in leading-edge photo resists"
Presented by: Aiwen Wu
Paper: 10586-43
Authors: Author(s): Tetsu Kohyama, Aiwen Wu, Yasushi Ohyashiki, Kozue Miura, Entegris, Inc. (United States)
Defect source reduction in leading-edge iArF resists is a critical requirement to improve device performance and overall yield in lithography manufacturing processes. It is believed that polymers with lactone rich regions can aggregate and be responsible for single or multiple micro-bridge defects. We have previously presented the effective removal of gel-like polymers using Nylon. However, as the industry is moving to smaller feature sizes, there is a need to further improve the defect removal efficiency. In this paper, a novel filter with unique membrane morphology is introduced, which shows excellent on wafer performance in advanced ArF solution.
"Removal of metallic contamination from lithography solvents using functionalized membrane purifiers"
Presented by: Tetsu Kohyama
Paper 10586-44
Author(s): Aiwen Wu, Entegris, Inc. (United States); Tetsu Kohyama, Entegris, Inc. (Japan); James Hamzik, Saksatha Ly, Jad Jabber, Entegris, Inc. (United States)
Metal ions in the photoresist and solvents now pose an ever greater contamination problem in photolithography’s advanced applications with sub-14 nm device features. The reduction of metal contaminants is critical in the entire photochemical supply chain. In this paper we demonstrate that two novel membrane purifiers dramatically reduced the metal contents in polymer solutions and a range of organic solvents. These materials are used for photoresist manufacturing and for wafer surface and dispense line rinse in a track tool. The impact of flow rate and metal concentrations in the feed on the metal removal efficiency of the purifiers is presented.