Post Etch Cleaning Solutions
Industry leading solutions for post etch processing needs
Complete range of solutions for the post chemical mechanical planarization (Post CMP) cleaning process. Solutions offer excellent corrosion control, surface contamination removal and cost of operation performance.
The TitanKlean® family of solutions covers all application needs from hard mask preservation to partial removal and full removal, and offers solutions compatible with all advanced metalization schemes. Initially designed to meet the Post Etch Residue and Hard Mask Removal requirements in Advanced Logic, the application space is expanding in to advanced memory applications.