Fundamentals of Post CMP Cleaning of Dielectric Surface Contamination

Fundamentals of Post CMP Cleaning of Dielectric Surface Contaminated

AGENDA

  • Fundamentals of Ceria-Silica CMP Process
  • Reactivity Between Ceria and SiO2and Si3N4
  • Commodity Cleaner vs.Formulated Cleaners
  • Formulation Design Concept and Components
  • Ceria Cleaning Mechanism –Spectroscopic Evidences
  • Positive vs. Negatively Modified Ceria Cleaners
  • Entegris Recommendations
  • Conclusions