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The NT™ Proportional Control Valve, Model 6300 Cv 5.6 - 10 is developed for use in ultra high-purity applications. Compatible with highly corrosive processes and designed for use in CMP slurry applications.
Flow Factor
- > 2.8
- Semiconductor
- Bulk Chemical Delivery
- CMP
- Photolithography
- Wafer Growing
Our catalyst and adsorber, PS6, O2 bulk gas purifiers efficiently remove H2O, CO, CO2, H2, and THC at flow rates up to 16,667 slpm (1,000 Nm3/hr).
Gases Purified
- Oxygen (O2)
Our porous graphite that has high thermal conductivity and very efficient thermal energy transfer characteristics.
Material
- Porous Graphite
- General Industrial
The larger 6" pressure vacuum vessel gives you 2.5 times more volume per inch than the 4" vessels, enabling you to dispense more fluid in less space.
Size
- 6"
Our dual capacity injection molded tank enables you to process twice as many 150 mm cassettes in half the time
Capacity
- Dual
- Rectanglular
- 150 mm
- Semiconductor
Secure protection for 100 mm solar cells or other square devices
Capacity
- 25
- 100 mm
Secure protection for 125 mm solar cells or other square devices
Capacity
- 25
- 125 mm
Thermally insensitive full silicon carbide assemblies for space, airborne, or ground applications
Industry
- Aerospace
- Optical Systems
SUPERSiC® Silicon Carbide wafer and wafer carrier solutions that fit all horizontal furnace systems. See benefits.
Industry
- Semiconductor
- Solar/PV
- Deposition
Our PS15 HGU heated catalyst gas purifiers efficiently remove CO, CO2, and THC at flow rates of up to 100 slpm (6 Nm3/hr).
Gases Purified
- Extreme clean dry air (XCDA®)
- Oxygen (O2)