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Showing 10 of 620 results for ddos防攻击术✅️110011.cc⭐服务器ddos防攻击s2148✅️110011.cc⭐防ddos攻击转发0cbm0
PES 0.22 µm capsule filter that delivers superior flow rates in a broad range of chemical conditions to deliver significant economic advantages
Brand Name
- Pharmsteri™
- Acids
- Buffers
- Bases
- Life Sciences
- Pharmaceutical
- Steam-in-Place (SIP)
ST-26S solution contains a complexing agent which greatly enhances the removal of residual metal oxides and other inorganics formed during aggressive plasma etching and ashing. This unique solution effectively permeates heavily oxidized residues and rapidly dissolves them before they can redeposit back onto the substrate. Formulated with an extremely low operating viscosity and a corrosion reducing component, ST-26S is ideal for use in automated photoresist stripping equipment.
Interconnect Technology
- Al
- 250, 130, 90, 65
- Semiconductor
- Post CMP
The NT™ Proportional Control Valve, Model 6300 Cv ≤ 2.8 is developed for use in ultra high-purity applications. Compatible with highly corrosive processes and designed for use in CMP slurry applications.
Flow Factor
- ≤ 2.8
- Semiconductor
- Bulk Chemical Delivery
- CMP
- Photolithography
- Wafer Growing
Deliver field- and lab-proven performance in advanced manufacturing environments in semiconductor, flat panel, and LED fabs
Contaminants
- Acids
- Bases
- Organics
- Semiconductor
- Data Storage
- LED
- CMP
- Deposition
- Dry Etch
- Ion Implant
Best-in-class, leading-edge filtration of solvents and BEOL chemistries
Brand Name
- Torrento®
- Solvent
- <10 nm
- 14-22 nm
- Point of Tool
- Point of Dispense
- Bulk
Small volume, point of dispense acid, base and solvent filter
Brand Name
Feature Size (Layer)
- Fluoroline™
- Photochemical
- Solvent
- Aggressive Acids
- Aggressive Bases
- >90 nm
- Point of Dispense
GateKeeper® HX Series - Gases Purified: Hydrogen (H2), Nitrogen (N2) or Argon (Ar). Continuous flow, point-of-use purified hydrogen, nitrogen or argon gas at a low cost of ownership.
Gases Purified
- Argon (Ar)
- Hydrogen (H2)
- Oxygen (O2)
Our porous graphite that has high thermal conductivity and very efficient thermal energy transfer characteristics.
Material
- Porous Graphite
- General Industrial
Our GPU gas purifiers efficiently remove halogenated gases, hydrides, reactive oxides, saturated and unsaturated hydrocarbons, fluorocarbons and chlorocarbons at a variety of flow rates.
Gases Purified
- Other gases
- Xenon (Xe)
- Helium (He)
- Argon (AR)
UltraPur™ TEPO is a liquid precursor used in the deposition of doped silicate glass.
CAS #
- 78-40-0
- C6H15O4P
- Triethylphosphate
- Semiconductor