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See specifications for ZEE-2 semiconductor graphite. This hard, wear-resistant material offers improved performance in current and next generation implant equipment.
Shore Hardness
  • 100
Apparent Density, g/cm3 (lb/in3)
  • 1.77 (0.064)
Coefficient of Thermal Expansion, µm/m °C (µin/in °F)
  • 8.4 (4.65)
Compressive Strength, MPa (psi)
  • 193 (28,000)
Learn more about our SFG semiconductor graphite for ion implant, plasma etch and deposition applications.
Shore Hardness
  • 84
Apparent Density, g/cm3 (lb/in3)
  • 1.77 (0.064)
Coefficient of Thermal Expansion, µm/m °C (µin/in °F)
  • 8.1 (4.4)
Compressive Strength, MPa (psi)
  • 166 (24,100)
See benefits for DFP semiconductor graphite. Ideal for plasma etch, deposition and structural components in ion implant applications.
Shore Hardness
  • 74
Apparent Density, g/cm3 (lb/in3)
  • 1.77 (0.064)
Coefficient of Thermal Expansion, µm/m °C (µin/in °F)
  • 8.1 (4.5)
Compressive Strength, MPa (psi)
  • 140 (20,000)
Semiconductor PLS graphite offers high thermal and electrical conductivity. This specialty material is ideal for plasma etch and deposition.
Shore Hardness
  • 68
Apparent Density, g/cm3 (lb/in3)
  • 1.77 (0.064)
Coefficient of Thermal Expansion, µm/m °C (µin/in °F)
  • 8.2 (4.55)
Compressive Strength, MPa (psi)
  • 100 (14,500)
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