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VaporSorb™ MET Chemical Filters deliver complete protection against the full range of airborne molecular contaminants at 22 nm and below.
Contaminants
  • Acids
  • Bases
  • Organics
VaporSorb™ II Chemical Air Filters provide a full range of protection against Total Molecular Base (TMB) chemicals.
Contaminants
  • Bases
VaporSorb™ II-ABC Lithography Track Chemical Air Filters provide superior protection against acids, amines and condensable organics in Tokyo Electron (TEL) Lithography Tracks.
Contaminants
  • Acids
  • Bases
  • Organics
VaporSorb™ II AB lithography Track Filters provide superior protection against acid and amine-based contaminants in Tokyo Electron Lithography Tracks.
Contaminants
  • Acids
  • Bases
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