ST-22 positive resist stripper is a positive photoresist stripper specifically formulated from organic solvent blends to be effective in removing hard-to-strip positive photoresists. ST-22 is completely water soluble, contains no phenols, chlorinated hydrocarbons, or other toxic materials. In addition, ST-22 is formulated for ease of disposal.
ST-33 positive resist stripper is formulated from organic solvents to be effective in the removal of positive photoresists from corrosion-sensitive substrates. It has a unique chemistry that eliminates corrosive etching of GaAs and other III-V metals and copper.
The Entegris series of ST-200 Solutions has been formulated to remove heavily oxidized plasma etch residues from small geometry devices. The products contain no SARA-reportable components such as ethylene glycol ether based solvents, N-Methylpyrrolidone, or highly reactive materials such as hydroxylamine.
ST-28M plasma residue remover has been formulated to remove the residues associated with high energy plasma etchers and small geometry devices. ST-28M can be used to remove both organic and inorganic residues, but is especially effective in removing the residues remaining after today’s high temperature O2 ash processes
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