Extreme Ultraviolet Light (EUV) Reticle Pods


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Enabling Advanced Lithography: The Challenges of Storing and Transporting EUV Reticles
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  • Mask Size
  • Industry
  • Process
Advanced extreme ultraviolet light (EUV) reticle pod is designed to provide defect-free protection of EUV reticles enabling the high-volume manufacturing of advanced technology nodes during storage, handling and vacuum-transfer operations.
Dome Material
  • CNT polycarbonate
Mask Size
  • 152 mm x 152 mm x 6.35 mm (6" x 6" x 0.25")
Industry
  • Semiconductor
Process
  • Photolithography
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