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  • Industry
  • Process
  • Mask Size
Extreme ultraviolet light (EUV) reticle pod is designed to provide defect-free protection of EUV reticles during storage, handling and vacuum-transfer operations
Industry
  • Semiconductor
Process
  • Photolithography
Dome Material
  • CNT polycarbonate
Mask Size
  • 152 mm sq. (6" sq.)
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