CMP Pad Conditioners and Cleaning Brushes


Featured Information

Yield Advantages Through Maintaining and Upgrading FOUP Populations

Featured Information

Yield Advantages Through Maintaining and Upgrading FOUP Populations

Featured Information

Yield Advantages Through Maintaining and Upgrading FOUP Populations
Narrow Your Selection
  • Brand Name
  • OEM Tool
  • Product Type
  • Industry
  • Process
Rapid changeout and high performance for the most critical post CMP clean applications
Brand Name
  • Planarcore®
OEM Tool
  • Applied Materials Reflexion®
  • Applied Materials Mirra Mesa®
  • EBARA F-REX300
  • Lam Research OnTrak® series
Preservative
  • NH4OH
  • H2O2
Process Platform
  • 200 mm
  • 300 mm
Micro-machined SiC substrate delivers long life, highly uniform pad conditioning while minimizing substrate damage
Brand Name
  • Planargem®
Product Type
  • Pad conditioner
Industry
  • Semiconductor
  • Data Storage
Process
  • CMP
  • Glass disk polishing
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