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CMP Pad Conditioners

Application-tuned performance delivers precise and consistent pad surface morphology and material removal rate

Planargem® CMP pad conditioners offer leading-edge, customer-tailored performance across all aspects of the CMP process. They ensure a consistent wafer removal rate, extend pad and conditioner life, and improve disc-to-disc uniformity.

Featured Information

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Yield Advantages Through Maintaining and Upgrading FOUP Populations
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Featured Information

download-pdf
Yield Advantages Through Maintaining and Upgrading FOUP Populations
Request White Paper

Featured Information

download-pdf
Yield Advantages Through Maintaining and Upgrading FOUP Populations
Request White Paper
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200 mm Wafer Processing

With over 50 years of experience in advanced wafer handling and transport, Entegris continues to provide safe and reliable 200 mm wafer processing solutions.

From SMIF pods with superior minienvironment control, to wafer process carriers for wet chemical processing, to advanced transport carriers for automated handling and secure storage boxes, we have solutions to meet your specific wafer handling requirements.

 
150 mm Wafer Processing

To support the semiconductor industry's requirements for advanced 150 mm wafer handling, we offer a variety of wafer carriers, handling solutions and accessories that safely transport your silicon wafers.
125 mm Wafer Processing

Reliable wafer carriers and storage boxes that address the automation, contamination, and productivity concerns of today's 125 mm (5") fabs.
150 mm and Smaller Wafer Carrier Accessories

Learn about the numerous wafer carrier handles, wafer retainers, storage box cushions, and traveler envelopes available for use with our 150 mm (6"), 125 mm (5"), and 100 mm (4") wafer storage and handling products.
100 mm Wafer Processing

With over 50 years of experience in advanced wafer handling and transport, Entegris continues to provide 100 mm (4") wafer processing solutions to safely and reliably transport and protect silicon wafers.
300 mm Front Opening Unified Pods (FOUPs)

Our FOUPs (front-opening unified pods) hold 300 mm wafers safely and securely while they are transported and transferred within the fab as they move through hundreds of sophisticated process steps. Designed to address not only particles but to also minimize and control VOC, oxygen, and relative humidity (RH), our FOUPs provide superior microenvironment control, optimum automation integration, and low cost of ownership.
200 mm Accessories

Optimize the cleanliness and performance of your A200 and M200 wafer microenvironments with E200 door assemblies, replacement gaskets, handles, door seal kits, and more. 
Labware

We offer a wide variety of labware products to assist with wafer processing. Learn about our tweezers, tongs, vacuum probes, beakers, funnels strainers, dippers, baskets, trays, and more.
76.2 mm 3" Wafer Processing

With over 50 years of experience in advanced wafer handling and transport, Entegris continues to provide 76.2 mm (3") wafer processing solutions to safely and reliably transport and protect silicon wafers.
Chucks

Our chuck solutions use innovative coating technologies which make for a very flat surface that prevents metal contamination, reduces particles and is durable to last millions of wafer cycles. 
2.5" and Smaller Wafer Processing

With over 50 years of experience in advanced wafer handling and transport, Entegris continues to provide 2.5" and smaller wafer processing solutions to safely and reliably transport and protect silicon wafers.
CMP Pad Conditioners and Cleaning Brushes

Chemical mechanical planarization (CMP) is used to polish wafer surfaces between layers of material deposition. As semiconductor nodes shrink and chip architectures become increasingly more complex, CMP continues to evolve and gain in critical importance. We use a holistic approach in our development of CMP pad conditioners and cleaning brushes to deliver industry-leading innovation that enhances yield and process stability. Our portfolio of Planargem® XT pad conditioners deliver long life, highly uniform pad conditioning while our Planarcore® PVA brushes provide superior performance and wafer-to-wafer uniformity in post-CMP wafer cleaning applications.
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