Metallocenes
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- ALD precursors for semiconductor deposition
- High aspect ratio (HAR) ALD
- Higher temperature ALD processes
Specifications
Capabilities
(Reference numbers are shown on graphic above)
Our state-of-the art system for cracking dicyclopentadiene (1) allows access to the synthesis of a wide range of metallocene-based organometallics. The parent cyclopentadiene can be effectively derivatized to several alkyl-substituted cyclopentadienyl ligands (2), which allows for extensive customization of metallocene precursors. For example, MeCp and iPrCp can be readily prepared and attached to a preformed organometallic complex to yield products with motifs such as 3 (see graphic).
The cyclopentadienyl ligand can also be attached to metal halides, metal amides, and metal imides to yield products such as 4, 5, and 6 (see graphic). We also supply a full range of metal amides and imides to complement this chemistry and capability.
Metal carbonyls bearing Cp ligands 7a and 7b (see graphic) can also be accessed through reactions involving their parent metal carbonyls. Our commitment to safety ensures the safe handling of all raw materials and finished goods that have the propensity to lose carbon monoxide.
Product | Pentamethylcyclopentadienyl titanium trichloride, Cp*TiCl3 | |
Appearance | Red crystalline powder | |
NMR purity | >99.0% | |
Trace metals | Aluminum | <20 ppm |
Chromium | <10 ppm | |
Copper | <50 ppm | |
Iron | <20 ppm | |
Magnesium | <10 ppm | |
Nickel | <10 ppm | |
Zinc | <10 ppm |
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