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The NT™ Proportional Control Valve, Model 6300 Cv 5.6 - 10 is developed for use in ultra high-purity applications. Compatible with highly corrosive processes and designed for use in CMP slurry applications.
Flow Factor
- > 2.8
- Semiconductor
- Bulk Chemical Delivery
- CMP
- Photolithography
- Wafer Growing
Our catalyst and adsorber, PS6, O2 bulk gas purifiers efficiently remove H2O, CO, CO2, H2, and THC at flow rates up to 16,667 slpm (1,000 Nm3/hr).
Gases Purified
- Oxygen (O2)
Safely secure 2.5”, 2.25”, and 2” wafers in our convenient, easy to use wafer carriers
Product Type
- Process wafer carrier
The larger 6" pressure vacuum vessel gives you 2.5 times more volume per inch than the 4" vessels, enabling you to dispense more fluid in less space.
Size
- 6"
The E04 Wafer Storage Box delivers convenient, one-wafer capacity for 2.5” and smaller wafers
Product Type
- Storage box
Our dual capacity injection molded tank enables you to process twice as many 150 mm cassettes in half the time
Capacity
- Dual
- Rectanglular
- 150 mm
- Semiconductor
See specifications for AXF-5Q implantable graphite. Graphite without tungsten impregnation suitable for U.S. FDA Class II and III applications.
Shore Hardness
- 74
- 1.78 (0.064)
- 7.9 (4.4)
- 138 (20,000)
See specifications for AXF-5Q20W implantable graphite. Graphite with a higher tungsten impregnation suitable for U.S. FDA Class II and III applications.
Apparent Density, g/cm3 (lb/in3)
- 2.10 (0.076)
- 7.7 (4.3)
- 610 (1,550)
- 68 (10,000)
Our catalyst and adsorber, PS9, N2 bulk gas purifiers efficiently remove H2O, O2, CO, CO2, H2, and THC at flow rates up to 200,000 slpm (12,000 Nm3/hr).
Gases Purified
- Nitrogen (N2)
See specifications for AXM-5Q, a five micron grade graphite is a high-volume, moderate density material suited to applications requiring high performance.
Shore Hardness
- 72
- 1.73 (0.062)
- 7.8 (4.3)
- 124 (18,000)