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Showing 10 of 323 results for 澳门太阳城 加微信 AAPU669 直营官网邬t7s
ST-26S solution contains a complexing agent which greatly enhances the removal of residual metal oxides and other inorganics formed during aggressive plasma etching and ashing. This unique solution effectively permeates heavily oxidized residues and rapidly dissolves them before they can redeposit back onto the substrate. Formulated with an extremely low operating viscosity and a corrosion reducing component, ST-26S is ideal for use in automated photoresist stripping equipment.
Interconnect Technology
- Al
- 250, 130, 90, 65
- Semiconductor
- Post CMP
ESC T794 is a cost-effective cleaning product specially developed for cleaning hydrophobic surfaces in copper integration processing. This cleaning solution utilizes a high-pH formulation that removes contaminants generated by CMP process, while preventing corrosion of copper substrates.
Interconnect Technology
Industry
- Cu
- 130
- 90
- 65
- 45
- Semiconductor
- Post CMP
Best-in-class, leading-edge filtration of solvents and BEOL chemistries
Brand Name
- Torrento®
- Solvent
- <10 nm
- 14-22 nm
- Point of Tool
- Point of Dispense
- Bulk
Small volume, point of dispense acid, base and solvent filter
Brand Name
Feature Size (Layer)
- Fluoroline™
- Photochemical
- Solvent
- Aggressive Acids
- Aggressive Bases
- >90 nm
- Point of Dispense
Our palladium, PS7-PD, series H2 gas purifiers efficiently remove H2O, O2, CO, CO2, H2, THC, N2, He, and Ar at flow rates of up to 2,170 slpm (130 Nm3/hr).
Gases Purified
- Hydrogen (H2)
Our auto regenerable, PS7-A, H2 gas purifiers efficiently remove H2O, O2, CO, CO2, and NMHC at flow rates up to 16,667 slpm (1,000 Nm3/hr).
Gases Purified
- Hydrogen (H2)
Our cryogenic, PS7-CR, H2 gas purifiers efficiently remove H2O, O2, CO, CO2, THC, and N2 at flow rates of up to 16,667 slpm (1,000 Nm3/hr).
Gases Purified
- Hydrogen (H2)
Reliably control contaminants in bulk ultrapure and DI water applications with our highest-performance, HDPE ultrapure water filters
Brand Name
- Trinzik™
- DI Water
- Ultrapure Water
- Bulk
- Point of Tool
- Flat Panel Display
- Solar
- LED
- Data Storage
Our adsorber and getter, PS7-H, H2 gas purifiers efficiently remove H2O, O2, CO, CO2, THC, and N2 at flow rates up to 3,333 slpm (200 Nm3/hr).
Gases Purified
- Hydrogen (H2)
Ultrapur™ TMB is a precursor used in deposition of doped silicate glass in low pressure, plasma-enhanced CVD process.
CAS #
- 121-43-7
- C3H9BO3
- Trimethylborate
- Semiconductor