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The NT™ Proportional Control Valve, Model 6300 Cv 5.6 - 10 is developed for use in ultra high-purity applications. Compatible with highly corrosive processes and designed for use in CMP slurry applications.
Flow Factor
- > 2.8
- Semiconductor
- Bulk Chemical Delivery
- CMP
- Photolithography
- Wafer Growing
Our catalyst and adsorber, PS6, O2 bulk gas purifiers efficiently remove H2O, CO, CO2, H2, and THC at flow rates up to 16,667 slpm (1,000 Nm3/hr).
Gases Purified
- Oxygen (O2)
See how our hard 5 micron grade graphite can benefit your application.
Shore Hardness
- 95
- 1.77 (0.064)
- 8.5 (4.6)
- 186 (27,000)
The larger 6" pressure vacuum vessel gives you 2.5 times more volume per inch than the 4" vessels, enabling you to dispense more fluid in less space.
Size
- 6"
Our dual capacity injection molded tank enables you to process twice as many 150 mm cassettes in half the time
Capacity
- Dual
- Rectanglular
- 150 mm
- Semiconductor
See specifications for AXF-5Q10W implantable graphite. Graphite with tungsten impregnation suitable for U.S. FDA Class II and III applications.
Apparent Density, g/cm3 (lb/in3)
- 1.95 (0.070)
- 7.7 (4.3)
- 600 (1,500)
- 75 (11,000)
Our catalyst and adsorber, PS9, N2 bulk gas purifiers efficiently remove H2O, O2, CO, CO2, H2, and THC at flow rates up to 200,000 slpm (12,000 Nm3/hr).
Gases Purified
- Nitrogen (N2)
Our dual capacity 4.9 gallon injection molded tank enables you to process twice as many 125 mm cassettes in half the time
Capacity
- Dual (4.9 gallons)
- Rectanglular
- 125 mm
- Semiconductor
Store and delivers gas subatmospherically
Cylinder Volume
- 17L
- 50L
- AsH3
- PH3
- Subatmospheric storage and delivery (SAGS type I)
- Semiconductor
- Flat Panel Display
- Solar
Thermally insensitive full silicon carbide assemblies for space, airborne, or ground applications
Industry
- Aerospace
- Optical Systems