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Showing 10 of 476 results for pk10 加微信 AAPU669 直营官网严Zey
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ACF-10Q Graphite
ACF-10Q Graphite
ACF-10Q Graphite
See how our hard 5 micron grade graphite can benefit your application.
Shore Hardness
  • 95
 Apparent Density, g/cm3 (lb/in3)
  • 1.77 (0.064)
 Coefficient of Thermal Expansion, µm/m °C (µin/in °F)
  • 8.5 (4.6)
 Compressive Strength, MPa (psi)
  • 186 (27,000)
AXF-5Q10W Graphite
AXF-5Q10W Graphite
AXF-5Q10W Graphite
See specifications for AXF-5Q10W implantable graphite. Graphite with tungsten impregnation suitable for U.S. FDA Class II and III applications.
Apparent Density, g/cm3 (lb/in3)
  • 1.95 (0.070)
 Coefficient of Thermal Expansion, µm/m °C (µin/in °F)
  • 7.7 (4.3)
 Electrical Resistivity, µΩ-cm (µΩ-in)
  • 600 (1,500)
 Flexural Strength, MPa (psi)
  • 75 (11,000)
NT™ Proportional Control Valves, Model 6300, Cv 5.6 - 10
NT™ Proportional Control Valves, Model 6300, Cv 5.6 - 10
NT™ Proportional Control Valves, Model 6300, Cv 5.6 - 10
The NT™ Proportional Control Valve, Model 6300 Cv 5.6 - 10 is developed for use in ultra high-purity applications. Compatible with highly corrosive processes and designed for use in CMP slurry applications.
Flow Factor
  • > 2.8
 Industry
  • Semiconductor
 Process
  • Bulk Chemical Delivery
  • CMP
  • Photolithography
  • Wafer Growing
  • Wet Etch and Clean
Azora™ Photochemical Filter
Azora™ Photochemical Filter
Azora™ Photochemical Filter
Groundbreaking filtration media developed to improve critical photochemical performance in bulk chemical and point-of-use filtration applications
Brand Name
  • Azora™
 Chemistry
  • Photochemical
  • Photoresist
  • Solvent
 Feature Size (Layer)
  • <10 nm
 Installation Point
  • Point of Dispense
  • Bulk
NT™ Proportional Control Valves, Model 6300, Cv up to 2.8
NT™ Proportional Control Valves, Model 6300, Cv up to 2.8
NT™ Proportional Control Valves, Model 6300, Cv up to 2.8
The NT™ Proportional Control Valve, Model 6300 Cv ≤ 2.8 is developed for use in ultra high-purity applications. Compatible with highly corrosive processes and designed for use in CMP slurry applications.
Flow Factor
  • ≤ 2.8
 Industry
  • Semiconductor
 Process
  • Bulk Chemical Delivery
  • CMP
  • Photolithography
  • Wafer Growing
  • Wet Etch and Clean
MaxMT™ Chemical Dispense System
MaxMT™ Chemical Dispense System
MaxMT™ Chemical Dispense System
Chemical dispense system includes a control box and two connectors
Component Type
  • Dispense system
 Container Size
  • 10 to 40 liters
 Industry
  • Semiconductor
 Process
  • Chemical dispense
TEOS
TEOS
TEOS
UltraPur™ TEOS is a liquid precursor used in CVD process
CAS #
  • 78-10-4
 Chemical Formula
  • SiC8H20O4
 Element
  • Tetraethylorthosilicate
 Industry
  • Semiconductor
Accuflo™ Needle Valves, 1/4" Orifice, Panel Mount, Multi-turn
Accuflo™ Needle Valves, 1/4" Orifice, Panel Mount, Multi-turn
Accuflo™ Needle Valves, 1/4" Orifice, Panel Mount, Multi-turn
The all plastic, 10-turn needle valve enables smoother adjustment, more accurate flow and easier installation
Actuator Type
  • Manual multi-turn panel mount
 Port Connection
  • Flaretek®
  • FNPT
 Port Size
  • 1/4"
  • 3/8"
 Valve Type
  • Needle
VaporSorb™ CLR Chemical Air Filters
VaporSorb™ CLR Chemical Air Filters
VaporSorb™ CLR Chemical Air Filters
Deliver field- and lab-proven performance in advanced manufacturing environments in semiconductor, flat panel, and LED fabs
Contaminants
  • Acids
  • Bases
  • Organics
 Industry
  • Semiconductor
  • Data Storage
  • LED
 Process
  • CMP
  • Deposition
  • Dry Etch
  • Ion Implant
  • Photolithography
  • Wet Etch and Clean
  • Magnetic Head - Photolithography
  • Magnetic Head - CMP
  • Magnetic Head - Wet Etch and Clean
SilicoMax™ Coating
SilicoMax™ Coating
SilicoMax™ Coating
Find SilicoMax™ ultrapure silicon carbide coating at Entegris. Industry-leading PECVD coating technology solutions.
Coating Thickness
  • A few nm to over 60 µm
 Corrosion Resistance
  • Aqueous including acids and alkalis
 Electrical Resistivity
  • ~108 Ω-cm
 Hardness
  • 1600 HV
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