Appearing in the March, 2008 issue of Controlled Environments is a new article by Entegris authors Bipin Parekh, Ph.D., Annie Xia and Michael Clarke entitled, "Ultrapure Water Immersion Lithography: Purification Needs and Solutions."

The article profiles the purification needs of 193 nm lithography applications targeted to 65 nm features. The use of ultrapure water (UPW) in immersion lithography requires a purification system to eliminate interference for the laser transmission through the UPW between the final lens and the wafer. Throughout the article several sources of contamination, methods of control/prevention and system characteristics are described.

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Appearing in the February issue of Solid State Technology is a new article by Entegris authors Haizheng Zhang, Mufadal Ayubali, Jacob Andrews, Xia Man, Patrick Antle and Brewer Science’s Ryan Buschjost, entitled, "Membrane Compatibility for Nanofiltration Applications in DUV Lithography"

The article profiles development work to ensure the increasing complexity and sensitivity of photochemical formulations are maintained by filtration solutions at the manufacturing site and at point-of-use applications in the fab. In collaboration with Brewer Science, information is now available to demonstrate effective solutions to this challenge through the use of two filter membrane technologies in modern DUV-lithography applications.

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