New contamination control challenges emerge with each photolithography node in the semiconductor industry. Filtration is found in nearly all process steps where photochemicals contact the wafer. Entegris has recently completed research and applications testing that highlights the performance advantages of asymmetric membrane and two-stage dispense system technologies. These technologies are allowing photolithography processes to reduce microbridging and residue defects on wafers as chip line widths continue to shrink in each node.

To learn more click here to download a recent Entegris technical paper.

Controlling molecular contaminants in microenvironments has become more challenging than ever. That’s why Entegris scientists are actively searching – and finding – better ways to reduce molecular contamination in your processes.  Click on the links below to listen to Entegris scientists discussing their most recent work in contamination control.

Jim Ohlsen, Director of Materials Characterization

Chuck Extrand, Principal Scientist