Location
San Jose Convention Center
San Jose, California, USA
http://spie.org/advanced-lithography.xml
Exhibition
Tuesday, February 26, 10:00 a.m. – 5:00 p.m.
Wednesday, February 27, 10:00 a.m. – 4:00 p.m.
Visit Entegris at Booth #712!
Poster Sessions
Monday, February 25
5:30 p.m. – 8:00 p.m.
6923-137 Effect of nanofiltration on photochemical integrity, Mr. Jian Wei, Dr. Haizheng Zhang, Mr. Aiwen Wu
Thursday, February 28
7:00 p.m. – 9:00 p.m.
6924-180 More on practical solutions for reticle haze control: purged reticle stockers, Dr. Oleg P. Kishkovich, Mr. William Goodwin
6921-104 Study on the optimization of venting procedure using specially designed vent diffusers for semiconductor vacuum process tools, Mr. Christopher Vroman, Mr. Marshall Randolph