A Defect Reduction Collaboration Model
Semiconductor manufacturing variability increases as new materials, designs, techniques, and equipment are introduced and installed. Contamination variables also increase, and they require a new strategy for effective management.
Targeted removal is a promising solution that mitigates contaminants which negatively impact wafer yield, device performance, and long-term reliability without disturbing material composition. Fab managers, engineers (process, equipment, quality, reliability), equipment designers, component makers, and materials scientists all hold pieces to the defect prevention puzzle. By collaborating and using targeted contaminant removal strategies, we can solve some of today’s most complex semiconductor manufacturing challenges.
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Targeted Removal Assures Purity in Advanced Materials
A complex set of advanced materials and environmental controls interact in the process of semiconductor manufacturing, and each must meet a purity standard to ensure wafer yield and device reliability. The process of analyzing these interactions and removing specific contaminants while not disturbing the material composition is called targeted contaminant removal - a defect reduction collaboration model.
Featured White Paper
Targeted Contamination Removal Assures Purity in Advanced Materials
A Defect Reduction Collaboration Model: This paper examines a collaboration model and case studies to reduce defects while maintaining the composition of semiconductor manufacturing liquids, gases, and ambient air.
Product Solutions
Efficiently removes both dissolved and colloidal metal contaminants from a variety of ultrapure, polar and nonpolar solvents including difficult to remove ketones like cyclohexanone.
Best-in-class, clean, bulk and point of use photochemical filters, providing superior flow rate performance and excellent contaminant retention capabilities in all pattern development technologies.
Best-in-class, bulk and point-of-use CMP slurry filters utilizing nano melt blown (NMB) and multilayer depth media technologies to prevent micro-scratches and underlayer defects.
Best-in-class filtration of aqueous, outgassing, and aggressive acid and base chemistries to increase wafer yield and chemical manufacturing quality.
High-purity, dilute acid and base defect reduction solution that improves wafer yield performance and chemical manufacturing quality.
All-in-one purifying filter provides ultraclean purification for aggressive solvents, yielding superior particle retention and metal removal efficiency.
Ultraclean polymer housings and manifolds provide a variety of performance and operator safety benefits in 1, 2-up, 4-up, and 6-up configuration options.
Our vast portfolio of point-of-use gas purifiers and environmentally friendly systems are designed to improve gas consistency, lifetime, and outlet purity in space-saving footprints.
Entegris ultrapure gas filtration products offer 0.0015 micron particle filtration for ultrapure gas applications. Wafergard® gas filters enable higher process gas throughput while reducing the overall gas box footprint.
Entegris provides a portfolio of airborne molecular contamination control to help you control contaminants in the entire fab and protecting both process equipment and wafers from the damaging effects of AMC.
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