The ALD 2017 Conference will be a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films and now topics related to atomic layer etching.
The ALD 2017 Conference will be a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films and now topics related to atomic layer etching.
Entegris is a sponsor of the Atomic Layer Deposition Conference in Denver, Colorado
Please join us at the event as we present the following:
Sunday, July 16, 2:15 PM: Evaluation of Silicon Precursors for Low Temperature Silicon Nitride Deposition
Monday, July 17, 5:30 PM: Precursor Screening for Low Temperature Atomic Layer Deposition of SiO2 using Ozone