Entegris Announces Technology Collaboration with IBM

Joint development agreement focused on yield enhancement technologies for advanced semiconductor processes

PUBLISHED Feb. 24, 2011 | SEMICONDUCTOR

BILLERICA, Mass. – February 24, 2011 – Entegris, Inc. (NASDAQ: ENTG) announced today a joint development agreement with IBM (NYSE: IBM) to develop and test new filtration techniques for use in advanced semiconductor manufacturing.

The collaboration will focus on generating test data off of a new generation of Entegris filters and dispense systems that are used to dispense and filter imaging materials as part of the photolithography process in a semiconductor fab. Entegris, which is the only provider of both filters and dispense systems used for this application in the semiconductor industry, will work with IBM's technology team in East Fishkill, New York to develop new technologies for controlling impurities such as particles and bubbles that can negatively impact manufacturing yields. The use of new materials, process chemistries, and photolithography techniques are presenting new challenges for the semiconductor industry as it develops technologies to manufacture next-generation chips that are smaller, more powerful, and which consume less power.

Gideon Argov, president and CEO of Entegris, said. "This agreement complements the work we have been doing with other industry consortia to demonstrate the benefits of effective filtration on process yields in sub 32-nanometer node semiconductor manufacturing. We are delighted to be able to partner with one of the technology pioneers in our industry."