Ion implantation is one of the most contaminant-sensitive steps in semiconductor manufacturing. Without pre- or post-cleaning stages, even trace contaminants can degrade device performance. Entegris offers a comprehensive portfolio including high-purity dopant gases, storage and transport, filtration technologies, toxic gas delivery systems, advanced coatings and precision-engineered components — designed to maintain a particle, metal, and organics-free environment. Protect the integrity of your implant process with trusted solutions that ensure ultrapure, stable doping.
Ion Implant Solutions
Ultrapure Specialty Gases
Ensure precision wafer doping for consistent device electrical performance.
Gas delivery systems
Achieve safe and controlled gas delivery of highly toxic, pyrophoric, or corrosive gases.
Gas Contamination Control solutions
Prevent electrical failures with particle, metal and organic removal solutions.
foups
Prevent ESD particle generation and accumulation in wafer handling applications.
Safe Storage and Delivery of Toxic Gases
This paper presents key advancements in adsorbent-based packages for storing, handling, and delivering semiconductor dopant gases.