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Multi-Stage Filtration: For Improved CMP Slurry Large Particle Retention

Bradley Wood, application engineer, filtration, summarizes his poster presentation from the ASMC 2019 conference regarding CMP slurry filtration in IC manufacturing. He explains the importance of reducing large particles in the process to reduce scratches on the wafer by using both chemical delivery system (CDS) and point-of-use (POU) filtration. Runtime: 02:51