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Next-Generation Ultraclean Nylon Filter for On-Wafer Defects Reduction Enhancement

Watch Entegris applications engineer Kanjanawadee Shiraishi share her team’s research to develop an ultraclean nylon filter with lower levels of metallic and organic extractables in organic and acidic solvents. This reduces wafer defects in photolithography applications. Furthermore, the new filter’s high stability and low pH extractables suggest it can be adopted to certain acidic photochemicals such as used in SiARC and BARC applications. Runtime: 01:45