Entegris is the global leader in materials integrity management. The company delivers technology, product and service solutions that purify, protect and transport critical materials used in the semiconductor and other high-technology industries. These solutions are manufactured and serviced around the globe, with support in the United States, China, France, Germany, Japan, Malaysia, Singapore, South Korea and Taiwan. Entegris is ISO 9001 certified.
Entegris is committed to providing customers the best information possible to ensure optimal product performance. Our resource center provides in-depth product and application information through product data sheets, technical papers, SDSs and more. Be sure to visit the resource center regularly to see updates and new additions.
For 50 years, Entegris has been a provider of critical products and materials used in advanced high-technology manufacturing. These products and materials are often used to make the building blocks of many of the world's most complex microelectronic products, such as computers, mobile devices and phones, data storage components, televisions and monitors, and automobiles.
We provide a family of post chemical mechanical planarization (post-CMP) cleaning solutions. These solutions offer excellent corrosion control, surface contamination removal and cost of operation performance.
PlanarClean® AG-W100 Cleaning Solutions provide one-step, superior cleaning in advanced processes while protecting the underlying thin films and materials. The proprietary formulations offer increased performance through enhanced reliability and yield, low to zero corrosion and defect and increased queue time.
PlanarClean® AG formulated solutions provide superior cleaning in advanced processes while protecting the underlying thin films and materials. The proprietary formulations offer increased performance through enhanced reliability and yield, low to zero corrosion and defects and increased queue time.
PlanarClean® is the next-generation post-CMP copper cleaning product designed for use following the barrier CMP step. Formulated using our high-productivity testing and development process, PlanarClean comes as an aqueous solution with strong-acting agents that are very effective at preventing copper corrosion during and after the cleaning process.