CMP Cleaning Brushes
Post-CMP cleaning brushes designed to achieve uniform fluid distribution on the brush surface.
Our portfolio of Planarcore® PVA brushes delivers superior performance and wafer-to-wafer uniformity in post-CMP wafer cleaning applications. The unique molded-through-the-core technology provide absolute adhesion of the PVA (polyvinyl alcohol) to the brush core.
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Rapid changeout and high performance for the most critical post CMP clean applications
Brand Name
- Planarcore®
- Applied Materials Reflexion®
- Applied Materials Mirra Mesa®
- EBARA F-REX300
- Lam Research OnTrak® series
- NH4OH
- H2O2
- 200 mm
- 300 mm
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