The ProE-Vap® 200 delivery system is designed for solid precursors used in Atomic Layer Deposition (ALD) and Chemical Vapor Deposition (CVD) processes. It provides a stable mass flux for a wide variety of solid materials used for current and future technology nodes. Solid precursors are difficult to deliver consistently into deposition chambers due to their low vapor pressure and limited thermal stability. The ProE-Vap 200 system overcomes these problems and offers a solution that is unmatched in the industry.
More than seven times higher fill capacity than the ProE-Vap 100
Higher flux applications including batch furnaces
Holds 7X more chemistry for less down time for source changes
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ApplicationsProE-Vap® 200 Delivery System Applications