PlanarClean® is a post-CMP copper cleaning product designed for use following the barrier CMP step. PlanarClean comes as an aqueous solution with strong-acting agents that are very effective at preventing copper corrosion during and after the cleaning process.
Designed for use on all CMP platforms
Compatibility with copper and various dielectric materials
Excellent organic residue and removal
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Interested in PlanarClean® Cleaning Solution?
Contact your Entegris account manager or