Silicon Carbide Substrate Cleaning Solutions
Contact your Entegris account manager or
- CMP
Specifications
Product | Application |
TCL 185/186 | Pad and wafer cleaning solution. Highly effective in neutralizing CMP slurry oxidizer. |
SNST-CLN3/5 | Pad and wafer cleaning solution. Neutralizes oxidizer and reduces particle counts on wafer. |
PCL 565 | Industry-leading cleaning chemistry for SiC, optimized for excellent particle reduction of surface contamination generated from various processing steps. |
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