The TitanKlean® family of solutions covers all application needs from hard mask preservation to partial removal and full removal. In addition to the pre-requesite requirement for residue removal capability, these solutions have demonstrated excellent compatibility with advanced dielectric and metalization materials. Industry leading Cost of Operation performance is delivered through tunable, rapid, hard mask removal rates and inherent formulation stability and loading characteristics.
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ApplicationsTitanKlean® CU Cleaning Solution Applications