The TitanKlean® W family covers solutions capable to removing hard mask layers while being compatible with Tungsten and associated liner materials. In addition to the pre-requesite requirement for residue removal capability, these solutions have demonstrated excellent selectivity between hard mask materials and Tungsten. Initially designed for Post Etch applications in which Tungsten contacts were exposed - these solutions are applicable to any application in which a Ti Nitride hard mask needs to be removed in the presence of Tungsten.
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ApplicationsTitanKlean® W Cleaning Solution Applications