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HfCl4

UltraPur™ HfCl4 is a solid metallic halide used as a precursor for the formation of the high-k Metal Gate (HKMG) transistors and capacitor structures. In the ALD process, HfCl4 provides the source of Hf and a second precursor such as water or O3 as the source of oxygen.

  • Semiconductor grade purity
  • ProE-Vap® delivery system for solid delivery system
  • Two-year shelf life
  • Post fill morphology treatment to eliminate particle excursions
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