By 2030, 50% of the car costs are expected to be SC components-related. While it is an exciting source of growth for the complete supply chain, the car industry sets a great challenge for all of us: reaching the ppb level in failure rate at the component level. It obviously leads to the topic of purity and control in the CMP & WEC area.
By 2030, 50% of the car costs are expected to be SC components-related. While it is an exciting source of growth for the complete supply chain, the car industry sets a great challenge for all of us: reaching the ppb level in failure rate at the component level. It obviously leads to the topic of purity and control in the CMP & WEC area.
/content/entegris-live/en/home/about-us/events/cmp-and-wec-technology-dayOur specialists will present products and solutions that contribute to reduce operating costs, maximize efficiency and improve the value of your CMP & WEC operations - see program below. Take this opportunity to meet Entegris’ technologists, and exchange on your challenges. We will end up the day with a friendly and informal 'after work' party. You are all welcome!
Please contact us to register for the session of your choice by June 21st at the latest.
Program
Chemical Mechanical Planarization Session
08:30 | Registration & Welcome |
09:00 |
Introduction - Entegris company overview - CMP Challenges |
09:20 |
Increasing CoO with PlanarClean® Advanced Post-CMP Cleaning Solutions - Post-CMP cleans technical roadmap - Entegris PCMP cleans key benefits - BEOL & FEOL technology update |
09:55 |
Measuring and Controlling CMP Critical Chemistry - Flow metering and control for bulk and process chemicals - Monitoring real time chemical concentrations |
10:30 | Networking Refreshment Break |
10:50 |
Optimizing Filtration of CMP Slurries for Performance and Cost of Ownership - Full contamination control solution from bulk distribution to slurry dispense points - Nanofiber technology media vs traditional media |
11:25 |
Continuous Slurry Monitoring to Detect Agglomeration and Prevent Scratching - Why monitor LPCs? - Overview of Entegris online CMP monitoring solutions - Examples of how Entegris Particle Sizing Solutions can be used to improve the CMP process |
12:15 | Networking Lunch sponsored by Entegris |
Wet Etch & Clean Session
13:45 | Registration & Welcome |
14:05 |
Real Time Measurement and Control of Critical Chemistry - Flow metering and control of bulk and process chemicals - Refractive index technology to enable chemical mixing and dispense process excursion control |
14:40 |
Controlling Contamination To Manage Latent & Killer Defects - Particles and ions affect device reliability and yield - Filtration to support defectivity management - Most adequate solutions |
15:15 | Networking Refreshment Break |
15:35 |
Fluid Management to Address Critical Contamination and Safety Risks - High purity PFA tube to transport chemicals - Avoiding electro-static build-up in PFA tube - Safe and reliable connections for leak-free performance |
16:10 |
Application Expertise to Support Your Defect Management Strategy - Entegris capabilities - Real case examples - Towards a new collaboration |
17:00 | 'After work' sponsored by Entegris |