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Entegris is a proud sponsor of ALD/ALE 2025! As a key materials and equipment supplier to the global semiconductor industry, we’re heavily invested in the science surrounding this event, which drives some of the most important processes in chipmaking. Make sure to visit our poster session to get an update on our latest exciting research into materials science and materials purity.
Featured Presentation
June 23 | 5:45 – 7:00 p.m. | ALD Fundamentals Poster Session
ATOMIC LAYER DEPOSITION OF LOW CARBON HAFNIUM OXIDE USING (2-METHYLINDENYL)TRIS(DIMETHYLAMIDO)HAFNIUM AND OZONE
Presenter:
Drew Hood, Lead Scientist, Product Development
Learn about our latest discoveries around hafnium oxide ALD precursors! After testing deposition performance with a new precursor using ozone and water, we found that it outperformed benchmark compounds on factors such as carbon incorporation and precursor/oxidizer saturation. Talk to our expert and learn how to unlock additional benefits such as synthesis scalability.
Event Related Content
Visit our industry insights page to learn more about how Entegris supports semiconductor manufacturers in their drive to commercialize new innovations. Each new material requires altered process steps, which is why we carefully analyze each step to address unexpected interactions.