We are pleased to be a sponsor of the AVS 19th International Conference on Atomic Layer Deposition (ALD 2019) featuring the 6th International Atomic Layer Etching Workshop (ALE 2019). This event is dedicated to the science and technology of atomic layer controlled deposition of thin films and now topics related to atomic layer etching.
We are pleased to be a sponsor of the AVS 19th International Conference on Atomic Layer Deposition (ALD 2019) featuring the 6th International Atomic Layer Etching Workshop (ALE 2019). This event is dedicated to the science and technology of atomic layer controlled deposition of thin films and now topics related to atomic layer etching.
/content/entegris-live/en/home/about-us/events/ald-avs-2019Join Entegris as we present on the following topics:
Poster Sessions:
Monday, July 22 | 5:45 – 7:00 PM
In-Situ Process Monitoring of Precursor Delivery Using Infra-Red Spectroscopic Method
By: Robert Wright Jr., Thomas Baum
Synthesis of Group VI Oxyhalide Adducts and Mo Metal Film Growth on TiN Surfaces
By: David Ermert‚ Robert Wright Jr.‚ Thomas Baum
Presentation
Tuesday, July 23 | 3:15 – 3:30 PM
Room Grand Ballroom H-K
Selective Deposition of Silicon Nitride
By: Han Wang‚ Bryan Hendrix‚ Thomas Baum