Entegris was pleased to be a Silver sponsor and present on Improved Deposition Rate of Low T PEALD Silicon Nitride Using Amines during the oral presentations on Wednesday, August 1.

If you missed us at ALD 2018, view our latest white paper "The Silicon Precursor Toolbox for Low-Temperature Deposition" which outlines the role of precursors in depositing high-quality silicon-containing films under a wide range of challenging conditions. 

For more information, please contact us.