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See Past Events
ALD 2018

The AVS 18th International Conference on Atomic Layer Deposition (ALD 2018) featuring the 5th International Atomic Layer Etching Workshop (ALE 2018) will be a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films and now topics related to atomic layer etching.

Jul 29 - Aug 1 2018 Incheon South Korea Songdo Convensia
ALD 2018 July 29, 2018 9:19 PM August 1, 2018 9:19 PM Songdo Convensia

The AVS 18th International Conference on Atomic Layer Deposition (ALD 2018) featuring the 5th International Atomic Layer Etching Workshop (ALE 2018) will be a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films and now topics related to atomic layer etching.

 /content/entegris-live/en/home/about-us/events/atomic-layer-deposition-2018

 

Entegris was pleased to be a Silver sponsor and present on Improved Deposition Rate of Low T PEALD Silicon Nitride Using Amines during the oral presentations on Wednesday, August 1.

If you missed us at ALD 2018, view our latest white paper "The Silicon Precursor Toolbox for Low-Temperature Deposition" which outlines the role of precursors in depositing high-quality silicon-containing films under a wide range of challenging conditions. 

For more information, please contact us.