Join Us | Booth 23
Join Entegris at ESGS 2026 as our experts explore how advanced specialty gas technologies are helping semiconductor manufacturers meet the demands of next-generation device architectures. Through technical presentations and a poster session, we will share insights into gas purity, contamination control, innovative delivery technologies, and AI-enabled materials development that support improved process performance, reliability, and yield.
Featured Presentations
From Molecules to Manufacturing: Leveraging AI to Accelerate Advanced Specialty Gas Solutions
Mark O’Neill, Vice President, R&D and Engineering, Entegris
Tuesday, November 10th | 11:30 am – 12:00 pm
As semiconductor technology continues to evolve, specialty gas solutions must advance alongside increasingly demanding device and process requirements. This presentation explores how Entegris combines materials science, purification, packaging, modeling, and AI-driven development tools to accelerate innovation and bring high-performance gas solutions to market. Attendees will learn how integrated technologies help shorten development cycles and enable next-generation semiconductor manufacturing.
Opening Session Remarks - Contamination Control and Yield
Sarah Vogt, Director, E/R&D Gas Purification, Entegris
Tuesday, November 10th | 3:35pm -3:40 pm
Defining and Solving Contamination Challenges in Hydrogen Halides
Rocky Gipson, Senior Research & Development Manager, Entegris
Tuesday, November 10th | 4:10 – 4:40 pm
Hydrogen halides play a critical role in advanced semiconductor manufacturing, but each chemistry presents unique contamination and delivery challenges. This presentation examines the factors that can impact process reliability and discusses strategies for maintaining purity, improving gas delivery performance, and reducing downtime. Attendees will gain practical insights into addressing contamination risks across modern etch, cleaning, and deposition applications.
Poster Presentation
High Purity Precursors to Enable Etch Applications
Kaitlin Lawrence, Senior Manager, R&D Management – Specialty Gases, Entegris
As device geometries continue to shrink, the purity requirements for semiconductor process gases become increasingly stringent. This poster explores the role of ultra-high-purity phosphorus trifluoride (PF₃) in advanced etch applications and highlights how impurity control can improve process consistency and performance. Learn how Entegris is helping enable future semiconductor technologies through innovations in gas purification and delivery.