Booth #: 7
Please join Entegris at the 21st International Conference on Ion Implantation Technology as we present the following posters:
Investigation of Boron Gas Mixtures for Beamline Implant
Authors: Ying Tang, Oleg Byl, Sharad Yedave, Joseph Despres, Joseph Sweeney
Summary: Entegris will present additional studies of boron mixtures with the goal of further improving ion source performance. Specific mixtures tested include various compositions of BF3/B2H6 as well as BF3/B2H6/H2. Beam current and mixture stability are examined and ion source condition observations are provided.
Hydrogen Selenide (H2Se) Dopant Gas for Selenium Implantation
Authors: Ying Tang, Sharad Yedave, Joseph Despres, Oleg Byl, Joseph Sweeney
Summary: We will present performance and usage data associated with a subatmospheric source of H2Se, including beam setup, Se+ beam current, beam stability and source conditions. Material properties as well as the subatmospheric delivery source are also described.
Germanium Tetrafluoride (GeF4) and Hydrogen (H2) Mixture for Implanter Performance Improvement
Authors: Barry Chambers, Ying Tang, Steve Bishop, Joseph Sweeney, Thomas Morel and Marc Biossat
Summary: This discussion will demonstrate the advantages of mixing hydrogen (H2) with the GeF4 gas to increase implanter source life, extend the length of the beam campaign, improve beam performance and eliminate post beam purge time.
Carbon Implantation Performance Improvement by Mixing Carbon Monoxide (CO) with Carbonyl Fluoride (COF2) and Carbon Dioxide (CO2)
Authors: Ying Tang, Sharad Yedave, Oleg Byl, Joseph Despres, Eric Tien, Steve Bishop, Joseph Sweeney
Summary: Our experiments show that with the right balance and mixture level of COF2 and CO2, the carbon mixture can achieve improvements in key implant tool performance parameters, such as beam current and source life. Additionally, the CO/COF2/CO2 mixture stability is studied and a safe delivery package with reliability information is described.
Booth #: 7
Please join Entegris at the 21st International Conference on Ion Implantation Technology as we present the following posters:
Investigation of Boron Gas Mixtures for Beamline Implant
Authors: Ying Tang, Oleg Byl, Sharad Yedave, Joseph Despres, Joseph Sweeney
Summary: Entegris will present additional studies of boron mixtures with the goal of further improving ion source performance. Specific mixtures tested include various compositions of BF3/B2H6 as well as BF3/B2H6/H2. Beam current and mixture stability are examined and ion source condition observations are provided.
Hydrogen Selenide (H2Se) Dopant Gas for Selenium Implantation
Authors: Ying Tang, Sharad Yedave, Joseph Despres, Oleg Byl, Joseph Sweeney
Summary: We will present performance and usage data associated with a subatmospheric source of H2Se, including beam setup, Se+ beam current, beam stability and source conditions. Material properties as well as the subatmospheric delivery source are also described.
Germanium Tetrafluoride (GeF4) and Hydrogen (H2) Mixture for Implanter Performance Improvement
Authors: Barry Chambers, Ying Tang, Steve Bishop, Joseph Sweeney, Thomas Morel and Marc Biossat
Summary: This discussion will demonstrate the advantages of mixing hydrogen (H2) with the GeF4 gas to increase implanter source life, extend the length of the beam campaign, improve beam performance and eliminate post beam purge time.
Carbon Implantation Performance Improvement by Mixing Carbon Monoxide (CO) with Carbonyl Fluoride (COF2) and Carbon Dioxide (CO2)
Authors: Ying Tang, Sharad Yedave, Oleg Byl, Joseph Despres, Eric Tien, Steve Bishop, Joseph Sweeney
Summary: Our experiments show that with the right balance and mixture level of COF2 and CO2, the carbon mixture can achieve improvements in key implant tool performance parameters, such as beam current and source life. Additionally, the CO/COF2/CO2 mixture stability is studied and a safe delivery package with reliability information is described.
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