Join Us | Booth 52
FEATURED PRESENTATION – SEPTEMBER 19
Novel Silicon Carbide (SiC) Chemical Mechanical Planarization (CMP) Solutions for Enhanced Performance and Cost of Ownership
In this presentation, Pankaj Singh, Ph. D. R&D Substrate Director at Entegris, will share how our portfolio of slurries, pads, and cleaning chemistries enables customers to start with a high-yield process and reduce process development times. This integrated solutions approach addresses the critical needs around high removal rate coupled with excellent surface quality and defectivity.
Pankaj Singh, Ph.D. Director Substrate Slurry R&D, Entegris
Pankaj Singh, Ph. D. R&D Director for Substrates Slurry at Entegris, leads a global team focused on innovating and developing next generation slurries and cleans for various substrates such as SiC, Si, Rigid disks, Magnetic Heads, GaN, and Diamond.
With more than 15 years of experience in the semiconductor industry, Pankaj collaborates with leading integrated circuit (IC) and substrate manufacturers to deliver solutions for next generation technologies.Additionally, Pankaj has led teams responsible for commercialization and scale up of slurry products which meet quality and capacity needs for customers.Pankaj earned his doctorate in Materials Science and Engineering from the University of Florida with expertise in particle technology and interfacial science.