Entegris is pleased to be participating in the following sessions:

  • Tuesday, May 1 
           Poster Session, 5:15-6:45 p.m.
           Airborne Molecular Contamination: Formation, Impact,
           Measurement, and Removal of Nitrous Acid (HNO2)
           Authors: Jürgen M Lobert, Reena Srivastava and Frank
           Belanger, Entegris

  • Thursday, May 3
           Session 15 - Advanced Materials & Photonics, 10 a.m.
           Chairs: Marc Bergendahl, IBM Research; Pratik Joshi, Ph.D.,
           Samsung; Thomas Phely-Bobin, Ph.D., Entegris

As technology requirements become more challenging, base material performance as well as process interactions become a more significant contributor or detractor to Manufacturing success.  In this session, various elements contributing to process innovation and understanding are reviewed.  Additionally an inline optical device test system for wafer level characterization of silicon photonic manufacturing is reviewed.

ASMC 2018