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SEMICON® Korea 2021
With new COVID-19 cases increasing in December and Korean officials enacting extended restrictions on Social Distancing, SEMICON Korea 2021 at COEX in Seoul, South Korea, February 3-5, has been cancelled. Meanwhile, Semicon Korea will host the conference as an online program, and please visit SEMICON Korea website for the details.
Feb 3 - Feb 13 2021 Online, Conference Only Virtual Event
SEMICON® Korea 2021 February 3, 2021 1:00 PM February 13, 2021 1:00 AM Virtual Event With new COVID-19 cases increasing in December and Korean officials enacting extended restrictions on Social Distancing, SEMICON Korea 2021 at COEX in Seoul, South Korea, February 3-5, has been cancelled. Meanwhile, Semicon Korea will host the conference as an online program, and please visit SEMICON Korea website for the details. /content/entegris-live/en/home/about-us/events/semicon-korea-2021

EVENT-RELATED CONTENT

  • Holistic approach Entegris’ Holistic Approach to Enabling Device Performance, Yield, and Reliability
  • Purity and Safety: How to Select the Right Container System for Safe, Clean Chemical Delivery
Request Event Related Content

SEMI Technology Symposium | S5. CMP & Cleaning Technology (pre-recorded)


Topic: Novel CMP Filter Design that Reduces Fine Particles in Slurry Systems
Speaker: Benjamin Liao, Application Engineer

Fine particles are more difficult to remove during post-CMP cleaning, and the identification and reduction of fine particles is becoming more important as process technologies shrink. The APR media was expected to provide additional adsorption of fine particles when compared to PP depth media.

Benjamin will provide valuable information about how to monitor fine particles with DMA-CPC, and how a novel slurry filter effectively reduces fine particles counts and provides a more uniform abrasive PSD. 


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Advanced Particle Reduction (APR) Filtration
  • Next generation CMP slurry filtration for fine particle retention:
  • Reduces underlayer and microscratch defects with a multilayer media depth structures without sacrificing filter life
  • Reduce most large abrasive and slurry agglomerates